{ "schemaVersion": "1.0", "lastUpdated": "2026-08-28", "language": "zh-CN", "canonicalWebsite": "https://streamsemi.cn", "publisher": { "legalName": "深圳众睿芯半导体科技有限公司", "brand": "streamsemi", "relationship": "Pall / 颇尔代理经销与选型服务", "boundary": "streamsemi.cn 不是 Pall 官方网站，不声称独家、总代理或未经书面验证的授权范围" }, "brand": { "name": "Pall", "alternateName": "颇尔" }, "products": [ { "slug": "pall-falcon-p-nylon", "name": "Pall Falcon P-Nylon 光刻胶过滤器", "shortName": "Falcon P-Nylon", "category": "光刻胶设备点位过滤", "processPosition": "Point of use", "directAnswer": "Falcon P-Nylon 是 Pall 面向光刻胶与显影液设备点位过滤的产品系列。公开资料显示其采用亲水性尼龙 6,6 膜及 HDPE 支撑与硬件，选型时仍须核对介质、过滤等级、接口、流量压差、滞留量和启动验证。", "verifiedFacts": [ { "name": "公开应用位置", "value": "设备点位（POU）光刻胶与显影液过滤。" }, { "name": "公开膜材", "value": "亲水性尼龙 6,6；支撑与硬件为 HDPE。" }, { "name": "设计关注点", "value": "快速润湿、排气、低滞留量、低压差与较低析出。" }, { "name": "选型边界", "value": "不能仅凭“Falcon”名称替换；完整料号、过滤等级、密封和设备接口需逐项核对。" } ], "selectionInputs": [ "完整 Pall 料号与标签照片", "光刻胶或显影液名称、SDS 与黏度", "POU 泵型、安装空间与流向", "正常流量、压力与允许压差", "目标颗粒、凝胶、微气泡或缺陷问题", "启动冲洗、排气和材料损失验证方法" ], "notToBeExtrapolated": "Falcon 的低滞留和快速润湿设计不等于零材料损失，也不代表任何光刻胶配方都可直接使用。", "url": "https://streamsemi.cn/products/pall-falcon-p-nylon/", "parentUrl": "https://streamsemi.cn/products/pall-photoresist-filtration/", "officialSources": [ { "name": "Pall：Falcon P-Nylon Photoresist Filter", "url": "https://shop.pall.com/us/en/microelectronics/semiconductor/photolithography-2/zidgri78lnb" } ] }, { "slug": "pall-photokleen-ezd", "name": "Pall PhotoKleen EZD 过滤组件", "shortName": "PhotoKleen EZD", "category": "光化学品设备点位过滤", "processPosition": "Point of use", "directAnswer": "PhotoKleen EZD 是 Pall 面向光化学品设备点位分配的胶囊式过滤组件，由头部歧管接口与 HDPE 胶囊组成。公开资料强调快速更换、较小死区和降低启动阶段化学品浪费；具体膜材、等级和尺寸随配置而变。", "verifiedFacts": [ { "name": "公开应用位置", "value": "光化学品设备点位分配与相应 POU 过滤。" }, { "name": "公开结构", "value": "头部歧管接口与 HDPE 胶囊式过滤组件。" }, { "name": "膜材方向", "value": "公开配置涉及 P-Nylon、PE-Kleen 与 P Emflon；并非每种规格都具备全部选项。" }, { "name": "选型边界", "value": "EZD、EZD-3、EZD-3X 与 EZD-3XL 的尺寸、膜材和适配设备不同，不能按外形直接互换。" } ], "selectionInputs": [ "EZD / EZD-3 / EZD-3X / EZD-3XL 完整型号", "光化学品名称、SDS 与黏度", "分配泵、歧管和安装空间", "膜材、过滤等级与密封要求", "流量、压差和设备节拍", "更换、冲洗、排气与启动用量记录" ], "notToBeExtrapolated": "PhotoKleen 是过滤组件，不是去除溶解态金属离子的通用纯化器；金属离子问题应单独定义净化机制和验证指标。", "url": "https://streamsemi.cn/products/pall-photokleen-ezd/", "parentUrl": "https://streamsemi.cn/products/pall-photoresist-filtration/", "officialSources": [ { "name": "Pall：PhotoKleen EZD Filter Assembly", "url": "https://shop.pall.com/us/en/microelectronics/semiconductor/photolithography-2/zidgri78l6n" }, { "name": "Pall：PhotoKleen EZD-3 Filter Assembly", "url": "https://shop.pall.com/us/en/microelectronics/semiconductor/photolithography-2/zidgri78lwq" } ] }, { "slug": "pall-ultipleat-p-nylon", "name": "Pall Ultipleat P-Nylon 光刻过滤器", "shortName": "Ultipleat P-Nylon", "category": "光刻胶与显影液批量过滤", "processPosition": "Bulk filtration", "directAnswer": "Ultipleat P-Nylon 是 Pall 面向与尼龙 6,6 和 HDPE 兼容的光刻胶、溶剂、TMAH 基显影液及其他化学品批量过滤系列。官方公开规格包含多种过滤等级与长度，具体型号必须结合介质、流量、压差、密封和滤壳确认。", "verifiedFacts": [ { "name": "公开应用位置", "value": "光刻胶、相容溶剂和 TMAH 基显影液等批量过滤。" }, { "name": "公开膜材", "value": "亲水性尼龙 6,6；支撑、排液与硬件为 HDPE。" }, { "name": "公开等级方向", "value": "Pall 当前产品页列出 0.1 μm、40 nm 与 20 nm；可选配置须按完整料号确认。" }, { "name": "选型边界", "value": "“尼龙相容”不能仅凭介质通用名称判断，应以配方、SDS 与材料验证为准。" } ], "selectionInputs": [ "化学品全名、配方体系与 SDS", "批量、循环或灌装前位置", "目标颗粒与凝胶负载", "流量、黏度、温度和允许压差", "滤芯长度、端盖、O 形圈与滤壳", "冲洗体积、取样和缺陷验证方案" ], "notToBeExtrapolated": "官方列出的过滤等级是产品配置，不是对任意光刻胶缺陷、良率或滤芯寿命的保证。", "url": "https://streamsemi.cn/products/pall-ultipleat-p-nylon/", "parentUrl": "https://streamsemi.cn/products/pall-photoresist-filtration/", "officialSources": [ { "name": "Pall：Ultipleat P-Nylon Filter (Lithography)", "url": "https://shop.pall.com/us/en/microelectronics/semiconductor/photolithography-2/zidgri78m4v" } ] }, { "slug": "pall-pe-kleen", "name": "Pall PE-Kleen 与 Xpress PE-Kleen 过滤器", "shortName": "PE-Kleen / Xpress", "category": "先进光刻与批量过滤", "processPosition": "Bulk / advanced lithography", "directAnswer": "PE-Kleen 采用 HDPE 膜与 Pall Ultipleat 结构，公开资料面向高纯化学品、抗反射涂层及 248 nm、193 nm 光刻胶批量过滤。Xpress PE-Kleen 则是 Pall 面向先进图形化化学品和相应 EUV 材料公开的高流量亚 1 nm HDPE 方向。", "verifiedFacts": [ { "name": "公开介质方向", "value": "高纯化学品、抗反射涂层及 248 nm、193 nm 光刻胶批量过滤。" }, { "name": "公开膜材", "value": "高密度聚乙烯（HDPE）。" }, { "name": "先进光刻方向", "value": "Xpress PE-Kleen 官方页描述高流量亚 1 nm HDPE 方案，并提及先进图形化化学品与相应 EUV 光刻胶材料。" }, { "name": "选型边界", "value": "PE-Kleen 与 Xpress 不是同一洁净处理和等级的泛称，需按正式料号与数据表核对。" } ], "selectionInputs": [ "CAR、EUV、BARC 或其他材料体系", "批量、循环、灌装前或验证位置", "硬颗粒、凝胶、金属或缺陷目标", "目标等级、流量、黏度与允许压差", "滤芯尺寸、端盖、密封和滤壳", "初始洁净度、冲洗和材料保持验证" ], "notToBeExtrapolated": "“亚 1 nm”是 Xpress PE-Kleen 公开产品方向，不应外推到所有 PE-Kleen 型号，也不等同于所有 EUV 配方都适用。", "url": "https://streamsemi.cn/products/pall-pe-kleen/", "parentUrl": "https://streamsemi.cn/products/pall-photoresist-filtration/", "officialSources": [ { "name": "Pall：PE-Kleen Filter (Lithography)", "url": "https://shop.pall.com/us/en/microelectronics/semiconductor/photolithography-2/zidhhtg9053" }, { "name": "Pall：Xpress PE-Kleen", "url": "https://www.pall.com/en/microelectronics/semiconductor/photolithography/xpresspe-kleen.html" } ] }, { "slug": "pall-p-emflon", "name": "Pall P Emflon 光刻过滤器", "shortName": "P Emflon", "category": "光刻胶与光化学品过滤", "processPosition": "Bulk / capsule media", "directAnswer": "P Emflon 是 Pall 光刻产品分类中的 PTFE 膜过滤方向，可见于光刻过滤滤芯及 PhotoKleen 相应配置。它与 P-Nylon、PE-Kleen 的膜材和润湿行为不同，必须依据光刻化学品、预润湿、压差、滤壳和设备位置确认具体配置。", "verifiedFacts": [ { "name": "公开产品方向", "value": "Pall 光刻分类列有 P Emflon 过滤器，并在 PhotoKleen 配置中列出相应膜材方向。" }, { "name": "公开膜材", "value": "PTFE；支撑、硬件与密封随具体结构和料号核对。" }, { "name": "主要确认项", "value": "介质相容性、预润湿、排气、流量压差、滤芯或胶囊结构及安装位置。" }, { "name": "选型边界", "value": "不能把光刻用 P Emflon 与气体用 Emflon 系列仅按名称等同或互换。" } ], "selectionInputs": [ "完整 P Emflon 型号或产品照片", "光刻胶、BARC、溶剂或其他介质", "批量、灌装前或 PhotoKleen 配置位置", "润湿与启动方法", "流量、黏度、温度和允许压差", "接口、密封、滤壳与验证指标" ], "notToBeExtrapolated": "P Emflon 在光刻与气体产品中可能出现相近商标名称，但产品结构、介质和工况不同，必须按对应正式资料确认。", "url": "https://streamsemi.cn/products/pall-p-emflon/", "parentUrl": "https://streamsemi.cn/products/pall-photoresist-filtration/", "officialSources": [ { "name": "Pall：P Emflon Filter (Lithography)", "url": "https://shop.pall.com/us/en/microelectronics/semiconductor/photolithography-2/zidgri78l4b" }, { "name": "Pall：Photolithography product category", "url": "https://shop.pall.com/us/en/microelectronics/semiconductor/photolithography-2" } ] }, { "slug": "pall-ionkleen-sl", "name": "Pall IonKleen SL 金属离子纯化器", "shortName": "IonKleen SL", "category": "光刻胶前体与溶剂去金属", "processPosition": "Purification", "directAnswer": "IonKleen SL 是 Pall 面向有机溶剂及有机溶剂/树脂混合物金属离子去除的纯化器，官方资料将光刻胶制造用溶剂、树脂和聚合物前体列为推荐方向。它不是普通颗粒滤芯，成品光刻胶应用还必须验证有效组分保持。", "verifiedFacts": [ { "name": "公开处理对象", "value": "有机溶剂，以及有机溶剂与树脂的混合物。" }, { "name": "公开应用方向", "value": "光刻胶生产用溶剂、树脂、聚合物前体及相应超高纯溶剂应用。" }, { "name": "公开机制", "value": "离子交换基团共价键合在传统膜过滤器表面，用于金属离子去除。" }, { "name": "选型边界", "value": "成品光刻胶可能含会被非目标吸附的有效组分，不能仅凭“去金属”目标直接使用。" } ], "selectionInputs": [ "介质全名、SDS 与配方阶段", "目标金属元素及进料水平", "目标出口、检测方法与取样频次", "正常流量、温度、压力与批次体积", "树脂、聚合物或有效组分保持要求", "容量、突破判断与小样验证计划" ], "notToBeExtrapolated": "普通颗粒过滤、低析出控制和溶解态金属离子纯化是三类不同问题；IonKleen SL 也不应被写成对所有金属和所有配方的无条件保证。", "url": "https://streamsemi.cn/products/pall-ionkleen-sl/", "parentUrl": "https://streamsemi.cn/products/pall-photoresist-filtration/", "officialSources": [ { "name": "Pall：IonKleen SL Purifier", "url": "https://shop.pall.com/us/en/microelectronics/semiconductor/chemicals/zidgri78m4w" }, { "name": "Pall：IonKleen SL data sheet", "url": "https://shop.pall.com/de/en/attachment?DirectoryPath=pdfs%2FMicroelectronics&FileName=MEIKSLENc_230809.pdf&LocaleId=en_US&UnitName=PALL" } ] }, { "slug": "pall-gaskleen", "name": "Pall Gaskleen 半导体工艺气体过滤器", "shortName": "Gaskleen", "category": "超高纯工艺气体颗粒过滤", "processPosition": "Bulk / gas box / POU", "directAnswer": "Gaskleen 是 Pall 半导体工艺气体颗粒过滤产品系列，官方分类包含 IV、TM、Mini、Maxi 等不同结构和流量方向。选型不能只看过滤等级，还应核对气体兼容性、介质材料、流量压差、温压、接口、安装位置和维护方式。", "verifiedFacts": [ { "name": "公开产品范围", "value": "Pall 工艺气体分类列有 Gaskleen IV、TM、Mini、Maxi、6101 等多种方向。" }, { "name": "公开应用目的", "value": "半导体超高纯工艺气体的颗粒过滤。" }, { "name": "结构差异", "value": "不同系列涉及金属或含氟聚合物介质、表面安装或在线结构，以及不同接口和流量范围。" }, { "name": "选型边界", "value": "具体过滤等级、材料、最高温压和泄漏等级属于具体型号数据，不能从一个系列外推到全部 Gaskleen。" } ], "selectionInputs": [ "气体名称、浓度、危险特性和 SDS", "大宗、气柜、VMB 或设备点位", "正常与峰值流量、入口压力和允许压差", "工作温度、动态工况与烘烤要求", "介质材料、接口、流向与安装空间", "完整型号、系统图、泄漏和洁净验证要求" ], "notToBeExtrapolated": "Gaskleen 主要用于颗粒控制；水、氧、烃等分子杂质通常属于纯化问题，不能把过滤器和纯化器互相替代。", "url": "https://streamsemi.cn/products/pall-gaskleen/", "parentUrl": "https://streamsemi.cn/products/pall-process-gas-filtration/", "officialSources": [ { "name": "Pall：Process gas filtration category", "url": "https://shop.pall.com/us/en/microelectronics/semiconductor/process-gas-filtration-2" }, { "name": "Pall：Gaskleen IV Series", "url": "https://shop.pall.com/us/en/microelectronics/semiconductor/process-gas-filtration-2/zidgri78m4f" }, { "name": "Pall：Gaskleen TM Filter Assemblies", "url": "https://shop.pall.com/us/en/microelectronics/semiconductor/process-gas-filtration-2/zidgri78lps" } ] } ], "accuracyBoundary": "最终型号、规格、兼容性、供货状态、价格、交期和适用性须以 Pall 正式资料及项目书面确认为准。" }